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本基準說明半導體製造設備之能源、電力及原料的節約概念。
This Document covers requirements for carbon dioxide (CO2) that is used in the semiconductor industry
orgで入手可能となる。初版は1997年9月発行。
commonly called metric) units for 100 mm and larger diameter wafers
SEMI F63-0521 (technical revision)
P01000 - SEMI P10 - フォトマスクオーダーのデータ構造の仕様 Revision:SEMI P10-0708 - Superseded 本基準說明半導體製造設備之能源、電力及原料的節約概念。global Micropatterning Committee2008513global Audits and Reviews Subcommittee20066www. semi. org20087CD ROM199020077 Referenced SEMI Standards SEMI P1 Specification for Hard Surface Photomask Substrates SEMI P2 Specification for Chrome Thin Films for Hard Surface Photomasks SEMI P4 Specification for Round Quartz Photomask Substrates SEMI P5 Specification for Pellicles SEMI P6 Specification for Registration Marks for Photomasks SEMI P21 Guidelines for